Microelectronic Engineering
Published by Elsevier
ISSN : 0167-9317
Abbreviation : Microelectron. Eng.
Aims & Scope
Microelectronic Engineering is the premier nanoprocessing, and nanotechnology journal focusing on fabrication of electronic, photonic, bioelectronic, electromechanic and fluidic devices and systems, and their applications in the broad areas of electronics, photonics, energy, life sciences, and environment.
It covers also the expanding interdisciplinary field of "more than Moore" and "beyond Moore" integrated nanoelectronics / photonics and micro-/nano-/bio-systems.
Through its unique mixture of peer-reviewed articles, reviews, accelerated publications, short and Technical notes, and the latest research news on key developments, Microelectronic Engineering provides comprehensive coverage of this exciting, interdisciplinary and dynamic new field for researchers in academia and professionals in industry.
View Aims & ScopeMetrics & Ranking
Impact Factor
| Year | Value |
|---|---|
| 2025 | 3.1 |
SJR (SCImago Journal Rank)
| Year | Value |
|---|---|
| 2024 | 0.539 |
Quartile
| Year | Value |
|---|---|
| 2024 | Q2 |
h-index
| Year | Value |
|---|---|
| 2024 | 115 |
Impact Factor Trend
Abstracting & Indexing
Journal is indexed in leading academic databases, ensuring global visibility and accessibility of our peer-reviewed research.
Subjects & Keywords
Journal’s research areas, covering key disciplines and specialized sub-topics in Engineering, Materials Science and Physics and Astronomy, designed to support cutting-edge academic discovery.
Most Cited Articles
The Most Cited Articles section features the journal's most impactful research, based on citation counts. These articles have been referenced frequently by other researchers, indicating their significant contribution to their respective fields.
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Fabrication of microstructures with high aspect ratios and great structural heights by synchrotron radiation lithography, galvanoforming, and plastic moulding (LIGA process)
Citation: 906
Authors: E.W., W., P., A., D.
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Nanofabrication by electron beam lithography and its applications: A review
Citation: 716
Authors: Yifang
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Emerging trends in wide band gap semiconductors (SiC and GaN) technology for power devices
Citation: 487
Authors: Fabrizio, Patrick, Giuseppe, Raffaella, Filippo, Ferdinando, Mario
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Point-of-care testing (POCT) diagnostic systems using microfluidic lab-on-a-chip technologies
Citation: 465
Authors: Wooseok, Jungyoup, Jin-Woo, Chong H.
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Lab-on-a-chip devices: How to close and plug the lab?
Citation: 412
Authors: Yuksel, Robert D., Govind V., Emmanuel
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Towards implementation of a nickel silicide process for CMOS technologies
Citation: 383
Authors: C., F.M., C., C.
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Optimization of poly-di-methyl-siloxane (PDMS) substrates for studying cellular adhesion and motility
Citation: 365
Authors: D., T., S., P., P.
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Measurement of nonlinear mechanical properties of PDMS elastomer
Citation: 355
Authors: Tae Kyung, Jeong Koo, Ok Chan