Journal of Vacuum Science and Technology B
Published by AVS Science and Technology Society
ISSN : 2166-2746 eISSN : 2166-2754
Abbreviation : J. Vac. Sci. Technol. B
Aims & Scope
JVSTB is devoted to publishing reports of original research, letters, and review articles on microelectronics and nanotechnology.
The scope includes, but is not limited to, the following topics: Compound semiconductor electronics and optoelectronics; Dielectrics in micro- and nanoelectronics; Graphene, carbon nanotubes, and fullerenes: materials & devices; Group IV semiconductor microelectronics; Lithography; Microelectromechanical and nanoelectromechanical systems and devices (MEMS & NEMS); Nanometer science and nanotechnology; Nanostructured materials and devices including nanowires, nanoparticles and quantum dots, and organic and molecular electronics; Photovoltaics, batteries, and other devices for energy conversion and storage; Plasmonics; Spintronics and magnetic devices; Vacuum Measurement and Technology.
View Aims & ScopeMetrics & Ranking
Impact Factor
Year | Value |
---|---|
2025 | 1.2 |
2024 | 1.50 |
SJR (SCImago Journal Rank)
Year | Value |
---|---|
2024 | 0.280 |
Quartile
Year | Value |
---|---|
2024 | Q3 |
h-index
Year | Value |
---|---|
2024 | 127 |
Journal Rank
Year | Value |
---|---|
2024 | 17340 |
Journal Citation Indicator
Year | Value |
---|---|
2024 | 655 |
Impact Factor Trend
Abstracting & Indexing
Journal is indexed in leading academic databases, ensuring global visibility and accessibility of our peer-reviewed research.
Subjects & Keywords
Journal’s research areas, covering key disciplines and specialized sub-topics in Chemical Engineering, Engineering, Materials Science and Physics and Astronomy, designed to support cutting-edge academic discovery.
Most Cited Articles
The Most Cited Articles section features the journal's most impactful research, based on citation counts. These articles have been referenced frequently by other researchers, indicating their significant contribution to their respective fields.
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Phase change memory technology
Citation: 851
Authors: Geoffrey W., Matthew J., Michele, Davide, Kailash, Bryan, Bülent, Chung, Luis A., Alvaro, Bipin, Simone, Rohit S.
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Access devices for 3D crosspoint memory
Citation: 294
Authors: Geoffrey W., Rohit S., Kumar, Pritish, Alvaro, Bülent, Hyunsang
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Plasma-polymer interactions: A review of progress in understanding polymer resist mask durability during plasma etching for nanoscale fabrication
Citation: 171
Authors: Gottlieb S., Raymond J., David B.
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Review Article: FePt heat assisted magnetic recording media
Citation: 164
Authors: Dieter, Gregory, Oleksandr, Andreas, Dmitriy, Nataliia Y., Manfred
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Evidence of improved power conversion efficiency in lead-free CsGeI3 based perovskite solar cell heterostructure via <scp>scaps</scp> simulation
Citation: 149
Authors: Abhishek, Manish, Hemant, Ankit, Avneesh
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Electrical behavior of <i>β</i>-Ga2O3 Schottky diodes with different Schottky metals
Citation: 146
Authors: Yao, Raveena, Jaewoo, Kalyan Kumar, Robert F., Lisa M.
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Review Article: Synthesis, properties, and applications of fluorescent diamond particles
Citation: 130
Authors: Olga A., Alexander I., Nicholas A., Marco D., Igor, Alexander
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Multilayer MoS2 transistors enabled by a facile dry-transfer technique and thermal annealing
Citation: 124
Authors: Rui, Xuqian, Zenghui, Christopher J., Philip X.-L.
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Atomic diffusion bonding of wafers with thin nanocrystalline metal films
Citation: 123
Authors: T., M.