Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Aims & Scope

In 1983, the two journals, Journal of Vacuum Science and Technology A and B were launched when the original Journal of Vacuum Science and Technology was split.

JVSTA is devoted to publishing reports of original research, letters, and review articles on interfaces and surfaces of materials, thin films, and plasmas.

JVSTA publishes reports that advance the fundamental understanding of interfaces and surfaces at a fundamental level and that use this understanding to advance the state of the art in various technological applications.

The scope includes, but is not limited to, the following topics: -Applied and fundamental surface science -Atomic layer deposition -Electronic and photonic materials and their processing -Magnetic thin films and interfaces -Materials and thin films for energy conversion and storage -Photovoltaics, including inorganic and organic thin-film solar cells -Plasma science and technology, including plasma-surface interactions, plasma diagnostics plasma deposition and etching, and applications of plasmas to micro- and nanoelectronics -Surface engineering -Thin film deposition, etching, properties, and characterization -Transmission electron microscopy, including in situ methods -Tribology

View Aims & Scope

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Metrics & Ranking

Impact Factor

Year	Value
2025	2.1

SJR (SCImago Journal Rank)

Year	Value
2024	0.473

Quartile

Year	Value
2024	Q2

h-index

Year	Value
2024	127

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Abstracting & Indexing

Journal is indexed in leading academic databases, ensuring global visibility and accessibility of our peer-reviewed research.

• Scopus
• Google Scholar
• Web of Science

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Subjects & Keywords

Journal’s research areas, covering key disciplines and specialized sub-topics in Materials Science and Physics and Astronomy, designed to support cutting-edge academic discovery.

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Most Cited Articles

The Most Cited Articles section features the journal's most impactful research, based on citation counts. These articles have been referenced frequently by other researchers, indicating their significant contribution to their respective fields.

• Microstructural evolution during film growth

  Citation: 1576

  Authors: I., P. B., L., J. E.

• Nanosphere lithography: A materials general fabrication process for periodic particle array surfaces

  Citation: 1296

  Authors: John C., Richard P.

• Theory of ripple topography induced by ion bombardment

  Citation: 1291

  Authors: R. Mark, James M. E.

• Structural analysis of Si(111)-7×7 by UHV-transmission electron diffraction and microscopy

  Citation: 1241

  Authors: K., Y., M., S.

• The microstructure of sputter‐deposited coatings

  Citation: 1170

  Authors: John A.

• The search for novel, superhard materials

  Citation: 1107

  Authors: Stan

• Material selection for hard coatings

  Citation: 1081

  Authors: H.

• Titanium aluminum nitride films: A new alternative to TiN coatings

  Citation: 867

  Authors: Wolf‐Dieter

• Revised structure zone model for thin film physical structure

  Citation: 852

  Authors: R., A. P., R. A.

• Sculptured thin films and glancing angle deposition: Growth mechanics and applications

  Citation: 848

  Authors: K., M. J.

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