Journal of Photopolymer Science and Technology

Aims & Scope

Journal of Photopolymer Science and Technology is devoted to the publication of articles on the scientific progress and the technical development of photopolymers.

View Aims & Scope

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Metrics & Ranking

Impact Factor

Year	Value
2024	0.40

SJR (SCImago Journal Rank)

Year	Value
2024	0.264

Quartile

Year	Value
2024	Q3

h-index

Year	Value
2024	42

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Abstracting & Indexing

Journal is indexed in leading academic databases, ensuring global visibility and accessibility of our peer-reviewed research.

• Scopus
• Google Scholar
• Web of Science

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Subjects & Keywords

Journal’s research areas, covering key disciplines and specialized sub-topics in Chemistry and Materials Science, designed to support cutting-edge academic discovery.

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Most Cited Articles

The Most Cited Articles section features the journal's most impactful research, based on citation counts. These articles have been referenced frequently by other researchers, indicating their significant contribution to their respective fields.

• Nematic homogeneous photo alignment by polyimide exposure to linearly polarized uv.

  Citation: 158

  Authors: MASAKI, YOICHI

• Photo- and Bio-degradable Polyesters. Photodegradation Behaviors of Aliphatic Polyesters

  Citation: 121

  Authors: Eiji

• Optical Properties of Fluorinated Polyimides and Their Applications to Optical Components and Waveguide Circuits

  Citation: 94

  Authors: Shinji

• Mold Surface Treatment for Imprint Lithography.

  Citation: 92

  Authors: Yoshihiko, Satoshi, Akio, Yoshio, Masataka, Sigeo, Hideo, Masaru

• Secondary Electrons in EUV Lithography

  Citation: 78

  Authors: Justin, Ryan Del, Henry, Sanjana, Irina, Angela, Leonidas E., Carl, Eric, Greg, Robert L.

• Formation of Membrane-like Structures in Clotted Blood by Mild Plasma Treatment during Hemostasis

  Citation: 77

  Authors: Yuzuru, Hajime, Nobuyuki, Sanae, Hayao

• Environmentally stable chemical amplification positive resist: principle, chemistry, contamination resistance, and lithographic feasibility.

  Citation: 75

  Authors: Hiroshi, Greg, Don, R., Karen, David

• Optimizing Two-Photon Initiators and Exposure Conditions for Three-Dimensional Lithographic Microfabrication.

  Citation: 74

  Authors: Stephen M., Mariacristina, Toshiyuki, Kevin, Brian H., Ahmed A., Lael L., S., Stephen, Seth R., Joseph W.

• Liquid crystal alignment on photopolymer surfaces exposed by linearly polarized uv light.

  Citation: 70

  Authors: YASUFUMI, TADASHI, SHUNSUKE, TORU

• Step and Flash Imprint Lithography: An Efficient Nanoscale Printing Technology.

  Citation: 69

  Authors: T.C., S.C., S.V., J.G., C.G., D.J.

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