Journal of Micro/ Nanolithography, MEMS, and MOEMS

Aims & Scope

The Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3) publishes peer-reviewed papers on the core enabling technologies that address the patterning needs of the electronics industry.

Key subject areas include the science, development, and practice of lithographic, computational, etch, and integration technologies.

In this context the electronics industry includes but is not limited to integrated circuits and multichip modules, and advanced packaging with features in the submicron regime.

Metrics & Ranking

Abstracting & Indexing

Journal is indexed in leading academic databases, ensuring global visibility and accessibility of our peer-reviewed research.

• Scopus
• Google Scholar
• Web of Science

Subjects & Keywords

Journal’s research areas, covering key disciplines and specialized sub-topics in Engineering, Materials Science and Physics and Astronomy, designed to support cutting-edge academic discovery.

Most Cited Articles

The Most Cited Articles section features the journal's most impactful research, based on citation counts. These articles have been referenced frequently by other researchers, indicating their significant contribution to their respective fields.

• Optical properties of Teflon<sup>®</sup> AF amorphous fluoropolymers

  Citation: 137

  Authors: Min K.

• Hybrid energy harvester based on piezoelectric and electromagnetic mechanisms

  Citation: 119

  Authors: Bin

• Tunable infrared detector with integrated micromachined Fabry-Perot filter

  Citation: 96

  Authors: Norbert

• Implementation of a chemo-epitaxy flow for directed self-assembly on 300-mm wafer processing equipment

  Citation: 82

  Authors: Paulina A. Rincon

• Fast pixel-based mask optimization for inverse lithography

  Citation: 81

  Authors: Yuri

• Imbalance aware lithography hotspot detection: a deep learning approach

  Citation: 79

  Authors: Haoyu, Luyang, Jing, Chenxi, Bei

• Extreme ultraviolet interference lithography at the Paul Scherrer Institut

  Citation: 75

  Authors: Vaida

• Technology review and assessment of nanoimprint lithography for semiconductor and patterned media manufacturing

  Citation: 71

  Authors: Matt

• Novel method for characterizing resist performance

  Citation: 69

  Authors: Roel

• Accurate lithography hotspot detection using deep convolutional neural networks

  Citation: 68

  Authors: Moojoon, Jee-Hyong