Journal of Information Display
Published by Taylor & Francis
ISSN : 1598-0316 eISSN : 2158-1606
Abbreviation : J. Inf. Disp.
Aims & Scope
Journal of Information Display (JID) is the international journal of the Korean Information Display Society (KIDS), which was launched in 2000 and publishes four issues a year.
JID is published fully Open Access from 2017.
JID is a major multidisciplinary journal focusing specifically on display field, publishing latest advances in all aspects of display techniques developed from materials, as well as the application of display techniques in devices, and the system to user experience.
It aims to function as a main platform where display researchers in disparate expertise can share their knowledge, find latest achievement, and collaborate with one another, which results in advances of display technology and the industry.
JID publishes original and significant contributions dealing with the theory and practice of information displays.
The scope includes the following areas: • Liquid Crystal Display (LCD) • Light-emitting Diodes (LED) for Display • Organic LED (OLED) • Flexible and Stretchable Display • Quantum Dot (QD) Technology for Display • Large Area Display • Electroluminescence (EL) • Phosphors for Display • Applied Vision/Human Factors • 3D Displays • Displays for Augmented Reality and Virtual Reality • Field Emission Display (FED) • Liquid Crystal Technology • Material/Component/Manufacturing Equipment • Measurement for Display • Driving Techniques and Systems for Display • underlying Physics and Chemistry • and other related technologies.
View Aims & ScopeMetrics & Ranking
Impact Factor
Year | Value |
---|---|
2025 | 3.4 |
2024 | 3.70 |
SJR (SCImago Journal Rank)
Year | Value |
---|---|
2024 | 1.004 |
Quartile
Year | Value |
---|---|
2024 | Q1 |
h-index
Year | Value |
---|---|
2024 | 33 |
Journal Rank
Year | Value |
---|---|
2024 | 4797 |
Journal Citation Indicator
Year | Value |
---|---|
2024 | 354 |
Impact Factor Trend
Abstracting & Indexing
Journal is indexed in leading academic databases, ensuring global visibility and accessibility of our peer-reviewed research.
Subjects & Keywords
Journal’s research areas, covering key disciplines and specialized sub-topics in Engineering and Materials Science, designed to support cutting-edge academic discovery.
Licensing & Copyright
This journal operates under an Open Access model. Articles are freely accessible to the public immediately upon publication. The content is licensed under a Creative Commons Attribution 4.0 International License (CC BY 4.0), allowing users to share and adapt the work with proper attribution.
Copyright remains with the author(s), and no permission is required for non-commercial use, provided the original source is cited.
Policy Links
This section provides access to essential policy documents, guidelines, and resources related to the journal’s publication and submission processes.
- Aims scope
- Homepage
- Oa statement
- Author instructions
- License terms
- Review url
- Board url
- Copyright url
- Plagiarism url
- Preservation url
- Apc url
- License
Plagiarism Policy
This journal follows a plagiarism policy. All submitted manuscripts are screened using reliable plagiarism detection software to ensure originality and academic integrity. Authors are responsible for proper citation and acknowledgment of all sources, and any form of plagiarism, including self-plagiarism, will not be tolerated.
For more details, please refer to our official: Plagiarism Policy.
APC Details
The journal’s Article Processing Charge (APC) policies support open access publishing in Engineering and Materials Science, ensuring accessibility and quality in research dissemination.
This journal requires an Article Processing Charge (APC) to support open access publishing, covering peer review, editing, and distribution. The current APC is 925.00 GBP. Learn more.
Explore journals without APCs for alternative publishing options.
Most Cited Articles
The Most Cited Articles section features the journal's most impactful research, based on citation counts. These articles have been referenced frequently by other researchers, indicating their significant contribution to their respective fields.
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Progress in the development of the display performance of AR, VR, QLED and OLED devices in recent years
Citation: 158
Authors: Ho Jin, Jun Yeob, Geun Woo, Jeonghun, Jae-Hyeung
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Recent progress in computer-generated holography for three-dimensional scenes
Citation: 155
Authors: Jae-Hyeung
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A review of highly reliable flexible encapsulation technologies towards rollable and foldable OLEDs
Citation: 131
Authors: Eun Gyo, Jeong Hyun, Ki Suk, So Yeong, Kyung Cheol
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Review of recent advances in flexible oxide semiconductor thin-film transistors
Citation: 128
Authors: Jiazhen, Hyun-Jun, Ki-Lim, TaeHyun, Jin-Seong
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Progress of display performances: AR, VR, QLED, OLED, and TFT
Citation: 117
Authors: Ho Jin, Jun Yeob, Jeonghun, Dukho, Jae-Hyeung, Byoungho, Yong Young
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Photofieldâ€effect in amorphous Inâ€Gaâ€Znâ€O (aâ€IGZO) thinâ€film transistors
Citation: 94
Authors: Tzeâ€Ching, Chiaoâ€Shun, Kenji, Hanâ€Ping David, Hideo, Jerzy
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Past, present, and future of fringe-field switching-liquid crystal display
Citation: 92
Authors: Dae Hyung, Young Jin, Da Eun, Hongwen, Seon Hong, Seung Hee
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Recent progress in the development of backplane thin film transistors for information displays
Citation: 89
Authors: Dongseob, Jisu, Joon Hui, Dasol, You Seung, Do Kyung, Yong-Young
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Development of IGZO TFTs and their applications to nextâ€generation flatâ€panel displays
Citation: 82
Authors: Hsingâ€Hung, Hsiungâ€Hsing, Hungâ€Che, Chingâ€Sang, Chiaâ€Yu, Yusin
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Impact of cation compositions on the performance of thin-film transistors with amorphous indium gallium zinc oxide grown through atomic layer deposition
Citation: 78
Authors: Min Hoe, Min Jae, Hyunjoo, Pil Sang, Jong Uk, Kwon-Shik, Jae Kyeong