Applied Physics Express

Aims & Scope

Applied Physics Express (APEX) is a Letters journal devoted solely to rapid dissemination of up-to-date and concise reports on new findings in applied physics.

The motto of APEX is high scientific quality and prompt publication.

APEX is a sister journal of the Japanese Journal of Applied Physics (JJAP) and is published by IOP Publishing on behalf of the Japan Society of Applied Physics (JSAP) APEX publishes articles dealing with the applications of physical principles as well as articles concerning the understanding of physics with particular applications in mind.

As a Letters journal, emphasis will be given to developing and emerging fields in applied physics.

Examples of fields of current interest include: Semiconductors, dielectrics, and organic materials Photonics, quantum electronics, optics, and spectroscopy Spintronics, superconductivity, and strongly correlated materials Device physics including quantum information processing Physics-based circuits and systems Nanoscale science and technology Crystal growth, surfaces, interfaces, thin films, and bulk materials Plasmas, applied atomic and molecular physics, and applied nuclear physics Device processing, fabrication and measurement technologies, and instrumentation Cross-disciplinary areas such as bioelectronics/photonics, biosensing, environmental/energy technologies, and MEMS.

Metrics & Ranking

Abstracting & Indexing

Journal is indexed in leading academic databases, ensuring global visibility and accessibility of our peer-reviewed research.

• Scopus
• Google Scholar
• Directory of Open Access Journals (DOAJ)
• Web of Science

Subjects & Keywords

Journal’s research areas, covering key disciplines and specialized sub-topics in Engineering and Physics and Astronomy, designed to support cutting-edge academic discovery.

Licensing & Copyright

This journal operates under an Open Access model. Articles are freely accessible to the public immediately upon publication. The content is licensed under a Creative Commons Attribution 4.0 International License (CC BY 4.0), allowing users to share and adapt the work with proper attribution.

Copyright remains with the author(s), and no permission is required for non-commercial use, provided the original source is cited.

Policy Links

This section provides access to essential policy documents, guidelines, and resources related to the journal’s publication and submission processes.

• Aims scope
• Homepage
• Oa statement
• Author instructions
• License terms
• Review url
• Board url
• Copyright url
• Plagiarism url
• Preservation url
• Apc url
• License

Plagiarism Policy

This journal follows a plagiarism policy. All submitted manuscripts are screened using reliable plagiarism detection software to ensure originality and academic integrity. Authors are responsible for proper citation and acknowledgment of all sources, and any form of plagiarism, including self-plagiarism, will not be tolerated.

For more details, please refer to our official: Plagiarism Policy.

APC Details

The journal’s Article Processing Charge (APC) policies support open access publishing in Engineering and Physics and Astronomy, ensuring accessibility and quality in research dissemination.

This journal requires an Article Processing Charge (APC) to support open access publishing, covering peer review, editing, and distribution. The current APC is 1,800.00 GBP. Learn more.

Explore journals without APCs for alternative publishing options.

Most Cited Articles

The Most Cited Articles section features the journal's most impactful research, based on citation counts. These articles have been referenced frequently by other researchers, indicating their significant contribution to their respective fields.

• Enhanced Conversion Efficiencies of Cu₂ZnSnS₄-Based Thin Film Solar Cells by Using Preferential Etching Technique

  Citation: 727

  Authors: Hironori, Kazuo, Satoru, Tsuyoshi, Win Shwe, Tatsuo, Tadashi, Tomoyoshi

• Hybrid quantum systems based on magnonics

  Citation: 598

  Authors: Dany, Yutaka, Arnaud, Koji, Yasunobu

• Device-Quality $\beta$-Ga$_{2}$O$_{3}$ Epitaxial Films Fabricated by Ozone Molecular Beam Epitaxy

  Citation: 545

  Authors: Kohei, Akito, Takekazu, Encarnación G., Kiyoshi, Shigenobu

• Structure of Silicene Grown on Ag(111)

  Citation: 519

  Authors: Chun-Liang, Ryuichi, Kazuaki, Noriyuki, Emi, Yousoo, Noriaki, Maki

• Deep-ultraviolet light-emitting diodes with external quantum efficiency higher than 20% at 275 nm achieved by improving light-extraction efficiency

  Citation: 489

  Authors: Takayoshi, Takuya, Jun, Norimichi, Kenji, Hideki

• AlGaN Deep-Ultraviolet Light-Emitting Diodes with External Quantum Efficiency above 10%

  Citation: 435

  Authors: Max, Wenhong, Alex, Xuhong, Alex, Yuri, Jinwei, Michael, Remis, Craig, Gregory, Michael

• Development of X-ray-induced afterglow characterization system

  Citation: 372

  Authors: Takayuki, Yutaka, Takashi, Koro, Kuniyoshi

• High Mobility in a Stable Transparent Perovskite Oxide

  Citation: 370

  Authors: Hyung Joon, Useong, Hoon Min, Tai Hoon, Hyo Sik, Byung-Gu, Kwang Taek, Woong-Jhae, Chanjong, Kee Hoon, Kookrin

• Vertical Solar-Blind Deep-Ultraviolet Schottky Photodetectors Based on β-Ga₂O₃Substrates

  Citation: 361

  Authors: Takayoshi, Takeya, Naoki, Norihito, Shigeo, Shizuo

• Homoepitaxial growth of β-Ga₂O₃layers by halide vapor phase epitaxy

  Citation: 360

  Authors: Hisashi, Kazushiro, Ken, Kohei, Katsuaki, Quang Tu, Rie, Yoshinao, Masataka, Akito, Shigenobu, Bo, Akinori